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Alumina zinc oxide sputtering targethigh density( 5.5g/cm3), high even, low electric resistance,
stable sputter process
Alumina zinc oxide sputtering target made by balen havefollowing characteristic:
the purity is more than 99.99% ,
the relative density is more than 99%.
The size is as following:
The plate sputtering target:
all size within 600*300mm*20mm
The cylinder sputtering target:
the diameter:50-400mm
the thickness:5-20mm
the height:50-300mm.
